Massachusetts Institute of Technology (MIT)
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http://www.tgdaily.com/content/view/38302/113/
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New research results published by the MIT now suggest that there may be even more room left in common lithography. The research team said it has created 25 nm lines using interference lithography, sometimes also referred to as holographic lithography. While IBM has come up with 22 nm chips before and Intel’s 22 nm research is running at full speed in Oregon, the MIT result is impressive because of its relatively simple manufacturing technique. According to the researchers, the control of the lithographic imaging process is no longer the limiting step. Instead, the material issues such as line sidewall roughness appear to be now the major problems that need to be solved before smaller structures can be created. However, the scientists concluded that “there’s still a lot of room left for scale shrinkage in optical lithography. We don’t see any insurmountable roadblocks just yet.”
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http://www.tgdaily.com/content/view/38302/113/
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